VACUUM SYMPOSIUM

VS10 Posters

1. Thin-film coatings for electro-optics in a Quantum Engineering perspective.
   Roberto Alfano, Peter Smith
2. Mars within 39 days: The VASIMR
   Louis Kang, Yao Lu, Siyu Yang, Haojian Zhang
3. Adaptive nanocomposite coatings on the base of carbon-dopped titanium nitride
   Kazachenko, I. Razanau, A. Dvorak
4. Surface hardening of sealing elements made of elastomers using coatings on the base of diamond-like carbon Kazachenko, I. Razanau, A. Dvorak, M. Popova    Prize winner Day One
5. Electron induced chemistry and complex dynamic simulations of FEBID precursors
   Maria Pintea, Nigel Mason, Maria Tudorovskaya, Pablo de Vera
6. Ar plasma
   Ichiro Takano
7. A helicon plasma apparatus for fundamental wave-plasma experiments
   Kevin Ronald
8. Metrology for in-situ industrial plasma processing
   Michael Mo
9. Atmospheric pressure microplasma as synthesis method for nitrogen doped carbon quantum dots applied to third-generation solar cells
   Slavia Deeksha Dsouza
10. Time resolved electron properties measured by laser Thomson scattering in a HiPIMS plasma
    Marcus Law
11. Plasma-driven epoxidation using a He+O2 atmospheric pressure COST plasma jet
    Han Xu
12. An integrated microfluidic chip for generation and transfer of reactive species using gas plasma
    Oladayo Ogunyinka
13. Plasma cathode electron beam for high-integrity materials processing
    Andrew Sandeman
14. Enhanced Fuzzy Tungsten Growth in the Presence of Tungsten Deposition
    Patrick McCarthy
15. Investigation of a Capacitively Coupled RF Allylamine Discharge
    Michael Barnes
16. Power controlled Atmospheric-pressure Plasma Treatment System
    Junchen Ren
17. Electro carboxylation of Alkene with Carbon Dioxide in the presence of Plasma
    Muhammad Shaban
18. Discover the 2D World of Elements with XPS
    Guan, P. Davies, D. Morgan, D. Willock, R. Palgrave, D. Lennon, M. Isaacs
19. Atomic-Scale Device Fabrication for Silicon Quantum Technologies
    Procopios Constantinou, Taylor Stock, Steven Schofield, Neil Curson
20. Toward the atomic-scale placement of bismuth in silicon: Triphenylbismuth adsorption to Si(100)
    Eric Lundgren, Carly Byron, Procopios Constantinou, Taylor Stock, Lars Thomsen, Neil Curson, Oliver Warschkow, Andrew V. Teplyakov, Steven Schofield   Prize winner Day Two
21. Diffusivity of Si dopants in Steel
    D Thacker, P Davies, A Logsdail, F Robinson