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Vacuum and Plasmas for Industry

essential ingredients for manufacturing success

Wednesday 17th October 2012, Ricoh Arena Coventry


The theme of the meeting is to highlight areas where vacuum and the use of plasmas are important (and often essential) ingredients in industrial processes.  Invited papers will be given illustrating the use of these techniques in different commercial fields.


Morning Session
Chair: Alan Webb

09.30 – 10.00
Registration and coffee

10.00 – 10.10

10.10 – 10.40
Plasma Process Control in the Semiconductor Industry
Niall Macgearailt, Intel Ireland.

10.40 – 11.00
Plasma-catalysis for greenhouse gas conversion into fuels and carbon nanomaterials
Xin Tu, Department of Electrical Engineering and Electronics, The University of Liverpool

11.00 – 11.30
Low pressure processing in high pressure businesses
Delwyn Evans, P2i Ltd.

11.30 – 12.00
ARIEL’s E-linac and beam transport line vacuum systems
D. Yosifov, A. Koveshnikov, TRIUMF, Canada’s National Laboratory for Particle and Nuclear Physics

12.00 – 14.00
Lunch, Exhibition and Poster Session, (VACUUM GROUP AGM)

Afternoon Session:
Chair: John Colligon

14.00 – 14.30
Plasma-based Processes for Volume Manufacture of Magnetic Recording Heads
Denis O’Donnell, Seagate, Springtown, NI.

14.30 – 14.50
Large Area Coating for Glazing
John Oldfield, Pilkington Technology Centre, Nippon Sheet Glass Group

14.50 – 15.20
Tea break and Exhibition

15.20 – 16.10
The importance of vacuum and the control of pressure in freeze-drying
Kevin Ward, Biopharma Technology Ltd.

16.10 – 16.40
Reducing Wear using plasma based surface Engineering Processes
Allan Matthews, Department of Materials Science and Engineering, Sheffield University.

Closing remarks

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