essential ingredients for manufacturing success
Wednesday 17th October 2012, Ricoh Arena Coventry
The theme of the meeting is to highlight areas where vacuum and the use of plasmas are important (and often essential) ingredients in industrial processes. Invited papers will be given illustrating the use of these techniques in different commercial fields.
Chair: Alan Webb
09.30 – 10.00
Registration and coffee
10.00 – 10.10
10.10 – 10.40
Plasma Process Control in the Semiconductor Industry
Niall Macgearailt, Intel Ireland.
10.40 – 11.00
Plasma-catalysis for greenhouse gas conversion into fuels and carbon nanomaterials
Xin Tu, Department of Electrical Engineering and Electronics, The University of Liverpool
11.00 – 11.30
Low pressure processing in high pressure businesses
Delwyn Evans, P2i Ltd.
11.30 – 12.00
ARIEL’s E-linac and beam transport line vacuum systems
D. Yosifov, A. Koveshnikov, TRIUMF, Canada’s National Laboratory for Particle and Nuclear Physics
12.00 – 14.00
Lunch, Exhibition and Poster Session, (VACUUM GROUP AGM)
Chair: John Colligon
14.00 – 14.30
Plasma-based Processes for Volume Manufacture of Magnetic Recording Heads
Denis O’Donnell, Seagate, Springtown, NI.
14.30 – 14.50
Large Area Coating for Glazing
John Oldfield, Pilkington Technology Centre, Nippon Sheet Glass Group
14.50 – 15.20
Tea break and Exhibition
15.20 – 16.10
The importance of vacuum and the control of pressure in freeze-drying
Kevin Ward, Biopharma Technology Ltd.
16.10 – 16.40
Reducing Wear using plasma based surface Engineering Processes
Allan Matthews, Department of Materials Science and Engineering, Sheffield University.